This nickel vanadium (NiV) sputtering target from Nanografi is a 4'' disc, 0.125'' thick, with a purity of 99.95%. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established way to coat substrates of many shapes and sizes. The process is repeatable, works for small research and development runs, and can be scaled to production batches covering medium to large substrate areas. Depending on process parameters, chemical reactions may take place at the target surface, in flight or on the substrate, and the many adjustable parameters give experienced users considerable control over film growth and microstructure.
Beyond deposition, sputtering is also used for anisotropic etching and for surface analysis techniques such as secondary ion mass spectrometry (SIMS).
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is needed and selectivity is not a concern.
- Compositional analysis by secondary ion mass spectrometry (SIMS), including detection of very low impurity levels.
- Scale-up from research and development work to medium and large area production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01NI84
- Material: Nickel Vanadium (NiV)
- Size: 4''
- Thickness: 0.125''
- Product code: NG0ST01NI84
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