Nickel vanadium (NiV) sputtering targets are solid metallic alloy sources used in physical vapor deposition (PVD), particularly magnetron sputtering. During the process, ions bombard the target surface and eject atoms that condense onto a substrate to form a thin film. As a binary metal alloy, NiV combines the properties of its two constituent elements, which makes it useful for research requiring controlled metallic thin-film compositions.
- Quantity: 1 piece
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- Electrode and contact layer deposition in microelectronics and device research
- Diffusion barrier and adhesion layer studies in multilayer thin-film stacks
- Magnetic and spintronic thin-film development
- Protective and functional metallic coating research
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