Nickel vanadium (NiV) sputtering targets are solid metal alloy sources made from a combination of nickel and vanadium. They belong to the group of alloy sputtering materials used in physical vapor deposition (PVD), where the target is bombarded in a vacuum chamber so that its atoms deposit as a thin film onto a substrate.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Thin-film deposition research for electronic and semiconductor devices
- Development of magnetic and metallic thin-film layers
- Protective and functional coating studies
- Electrode and contact layer prototyping
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—