Niobium (Nb) sputtering targets are solid plates of the refractory transition metal niobium, designed for physical vapor deposition (PVD). In a sputtering process, ions bombard the target surface and eject atoms that condense onto a substrate, forming a uniform thin film. Niobium belongs to the refractory metal group, valued for its strength and stability at high temperatures. Targets are typically selected according to the desired film composition, deposition method, and chamber configuration.
- 1 piece
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- Optical and dielectric coatings for lenses and filters
- Thin-film electronics and semiconductor device research
- Protective and hard-wear coatings on metal and ceramic substrates
- Superconducting and quantum thin-film studies
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