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Nanografi

Niobium Oxide (Nb2O5) Sputtering Targets

Niobium Oxide (Nb2O5) Sputtering Targets
Regular price Rp 16.291.000,00
Regular price Sale price Rp 16.291.000,00
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Niobium oxide (Nb2O5) sputtering targets are oxide ceramic source materials used in physical vapor deposition, especially magnetron sputtering, to deposit niobium oxide thin films onto substrates. As an inorganic oxide, this target belongs to the advanced materials category offered within the Nanografi nanomaterials range for research and development use.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.

  • High-refractive-index layers in optical thin-film coatings
  • Dielectric layers in electronic and microelectronic device research
  • Electrochromic and smart-window thin-film studies
  • Photocatalytic and sensing thin-film development

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