This selenium (Se) sputtering target from Nanografi is supplied at 99.999% purity, with a size of 3'' and a thickness of 0.250''. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputter deposition can coat a broad range of substrate shapes and sizes, and the process is repeatable. It suits small research and development work and can be scaled to production batches covering medium to large substrate areas. Depending on the process settings, chemical reactions may take place at the target surface, in flight or on the substrate.
Because sputtering involves many adjustable parameters, it is a demanding technique, but it gives experienced users considerable control over film growth and microstructure.
- Thin film deposition of selenium onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not critical.
- Material analysis by etching away target material, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Research related to space weathering, where sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01SE06
- Material: Selenium (Se)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01SE06
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