Silicon carbide (SiC) sputtering targets are ceramic compound materials used as source material in physical vapor deposition to form thin films. SiC belongs to the group of wide-bandgap compound semiconductors and advanced technical ceramics, valued for its hardness and thermal stability. It is commonly used in research laboratories and industrial R&D. The product listing also mentions indium, which may refer to a bonding or backing configuration; please confirm this detail before ordering.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Thin-film deposition research for semiconductor and power electronics devices
- Protective and hard coating development
- Optical and dielectric thin-film studies
- MEMS and sensor component prototyping
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