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Silicon Carbide (SiC) Sputtering Targets, indium

Silicon Carbide (SiC) Sputtering Targets, indium
Regular price Rp 43.384.000,00
Regular price Sale price Rp 43.384.000,00
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Silicon carbide (SiC) sputtering targets are solid source materials used in physical vapor deposition (PVD) to form thin films. SiC is a hard, chemically stable ceramic compound from the advanced ceramics and wide-bandgap semiconductor family. This listing also references indium, which may indicate a bonding or backing configuration; please confirm the exact construction with our team before ordering.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of protective and wear-resistant thin films for research on hard coatings
  • Development of SiC-based layers for power electronics and semiconductor device studies
  • Fabrication of thin films for high-temperature and corrosion-resistant surface research
  • Materials research on wide-bandgap semiconductor thin films

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