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Nanografi

Silicon Carbide (SiC) Sputtering Targets

Silicon Carbide (SiC) Sputtering Targets
Regular price Rp 17.375.000,00
Regular price Sale price Rp 17.375.000,00
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Silicon carbide (SiC) sputtering targets are solid source materials used in physical vapor deposition (PVD) to form thin films by sputtering. SiC belongs to the family of advanced ceramics and wide-bandgap compound semiconductors, known for its hardness, thermal stability, and chemical resistance. Nanografi supplies these targets as nanomaterial-based sources for laboratory and pilot-scale research.

  • Quantity: 1 piece

For technical specifications, certificates of analysis (CoA), or quotations, please contact AMI Scientific.

  • Thin-film deposition for wide-bandgap power electronics research
  • Protective and wear-resistant coating development
  • MEMS and sensor device fabrication studies
  • High-temperature and optoelectronic coating research

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