Skip to product information
1 of 1

Nanografi

Silicon Carbide (SiC) Sputtering Targets

Silicon Carbide (SiC) Sputtering Targets
Regular price Rp 19.968.000,00
Regular price Sale price Rp 19.968.000,00
Sale Sold out
Shipping calculated at checkout.
Quantity
Quantity
Pembayaran hanya melalui request quotation dan dilakukan setelah tim kami menghubungi Anda. Mohon cantumkan nomor WhatsApp aktif untuk konfirmasi pesanan & pembuatan invoice. Estimasi pengiriman 1-2 bulan setelah pembayaran. Jika belum ada respons, hubungi +62 823-2282-4346.

View full details

Silicon carbide (SiC) sputtering targets are solid source plates made from a silicon carbide ceramic compound. They are used in physical vapor deposition (PVD) to form thin films on substrates. SiC belongs to the advanced ceramics and wide-bandgap semiconductor group, valued for its hardness, thermal stability, and chemical resistance.

  • 1 piece

For technical specifications, Certificate of Analysis (CoA), or a quotation, please contact AMI Scientific.

  • Deposition of SiC thin films for power and high-temperature electronic devices
  • Protective hard coatings for wear and corrosion resistance
  • Research on MEMS and optoelectronic components

Brand —
CAS number —
Molecular formula —
Purity —
Category —
Pack sizes —
Physical form —
Storage —

—

—