Silicon carbide (SiC) sputtering targets are solid source plates made of silicon and carbon, classified as advanced ceramic compound materials. In physical vapor deposition (PVD) processes, atoms are sputtered from the target surface and deposited onto a substrate to form SiC thin films.
- 1 piece
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- Thin-film deposition research for wide-bandgap semiconductor devices
- Protective and wear-resistant hard coatings
- Development of optoelectronic and MEMS device layers
- Studies of high-temperature and chemically resistant coatings
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