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Nanografi

Silicon Carbide (SiC) Sputtering Targets

Silicon Carbide (SiC) Sputtering Targets
Regular price Rp 25.812.000,00
Regular price Sale price Rp 25.812.000,00
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Silicon carbide (SiC) sputtering targets are solid ceramic compound sources used in physical vapor deposition to form silicon carbide thin films on substrates. SiC belongs to the wide-bandgap compound semiconductor and advanced ceramics group, known for its hardness, thermal stability, and chemical resistance. Nanografi supplies these targets for research-scale thin film processing.

  • 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of SiC thin films for power electronics and wide-bandgap semiconductor device research
  • Protective hard coatings for wear and corrosion resistance studies
  • Thin film development for MEMS and high-temperature sensor research
  • Optoelectronic and photonic material investigation

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