Silicon carbide (SiC) sputtering targets are solid source plates used in physical vapor deposition (PVD) to produce SiC thin films. SiC is a wide-bandgap ceramic compound semiconductor known for its hardness, thermal stability, and chemical resistance, which makes it a common material in advanced thin-film research.
- Quantity: 1 piece
For technical specifications, Certificate of Analysis (CoA), or quotations, please contact AMI Scientific.
- Deposition of SiC thin films for power electronics and semiconductor device research
- Protective and wear-resistant coatings studied for demanding mechanical environments
- Optoelectronic and photonic device development using wide-bandgap films
- High-temperature and corrosion-resistant coating research
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