Silicon dioxide (SiO2) sputtering targets made from fused quartz are ceramic source materials used in physical vapor deposition (PVD) processes. Fused quartz is an amorphous form of silica, valued for its thermal stability and optical transparency. Targets of this type are used to deposit thin silicon oxide films onto substrates. This listing also references indium, so please contact AMI Scientific for details on any bonding or backing configuration.
- Quantity: 1 piece
For technical specifications, certificates of analysis, or quotations, please contact AMI Scientific.
- Deposition of dielectric and insulating silicon oxide thin films in research
- Optical coating development for lenses and transparent substrates
- Semiconductor and microelectronics process development
- Protective and barrier layer studies on laboratory samples
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