This product is a silicon dioxide (SiO2) sputtering target made from fused quartz. Sputtering targets are solid source materials used in physical vapor deposition, where atoms are ejected from the target and deposited onto a substrate to form a thin film. Fused quartz is a synthetic, amorphous form of silica, so this target belongs to the oxide ceramic group of materials. The product title also lists indium, which may relate to how the target is bonded or mounted; please confirm its role with AMI Scientific.
- Quantity: 1 piece
For technical specifications, Certificate of Analysis, or a quotation, please contact AMI Scientific.
- Deposition of silica thin films for optical interference coatings
- Dielectric and insulating layers in microelectronics and semiconductor research
- Protective and passivation coatings in materials science studies
- Development of silica-based films for sensor and photonic devices
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