Silicon dioxide (SiO2) sputtering targets are solid, disc-shaped source materials used in physical vapor deposition (PVD) to form thin films by sputtering. This product is made from fused quartz, an amorphous (non-crystalline) form of silicon dioxide. The title also references indium, which may indicate a bonding or backing configuration, so please confirm details with our team. As an oxide ceramic, it belongs to the dielectric and glass-type material group.
- Quantity: 1 piece
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- Deposition of dielectric and insulating thin films in microelectronics research
- Optical coating layers for lenses, mirrors, and filters
- Protective and barrier coatings on glass and polymer substrates
- Fundamental studies of amorphous oxide thin-film properties
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