Silicon dioxide (SiO2) sputtering targets are solid oxide ceramic sources used in physical vapor deposition (PVD) to deposit thin silica films onto substrates. The material is based on fused quartz, an amorphous form of silicon dioxide valued for its optical transparency, thermal stability, and dielectric properties. It belongs to the inorganic oxide and dielectric material class.
- Quantity: 1 piece
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- Optical thin-film coatings, such as anti-reflection and dielectric layers
- Insulating and dielectric layers in microelectronics and device research
- Protective or barrier coatings on laboratory substrates
- Waveguide and photonic device development
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