Silicon dioxide (SiO2) sputtering targets are solid plates of silicon dioxide used as source material in physical vapor deposition, where sputtering transfers the material onto a substrate to form thin films. This product is made from fused quartz, an amorphous, glass-like form of silicon dioxide valued for its chemical stability and optical transparency.
- Quantity: 1 piece
For technical specifications, CoA, or quotations, please contact AMI Scientific.
- Optical thin films, such as antireflective and protective coatings
- Dielectric and insulating layers in microelectronics research
- Waveguide and photonic device fabrication
- Protective barrier coatings on research substrates
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