Silicon dioxide (SiO2) sputtering targets are solid ceramic plates made from fused quartz, an amorphous form of silica. As an inorganic oxide, SiO2 is widely used as a source material in physical vapor deposition, where sputtering transfers atoms from the target onto a substrate to form thin films. Fused quartz targets are valued for their chemical stability and low thermal expansion, which makes them a common choice for dielectric and optical thin-film work.
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- Optical thin-film coatings such as antireflective and protective layers
- Dielectric and insulating layers in microelectronics research
- Passivation and barrier films on semiconductor and glass substrates
- Thin-film device prototyping in university and industrial laboratories
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