Fused quartz silicon dioxide (SiO2) sputtering targets are solid, dense source pieces used in physical vapor deposition (PVD) to produce thin films. Fused quartz is an amorphous, non-crystalline form of silicon dioxide, a ceramic-class oxide valued for its chemical stability and optical transparency across a broad spectrum. During sputtering, energetic ions bombard the target surface and eject atoms that condense on a substrate, forming a uniform SiO2 layer.
- Quantity: 1 piece
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- Optical thin-film coatings, including antireflective and protective layers
- Dielectric and insulating layers in microelectronics and semiconductor research
- Protective barrier coatings on glass and optical components
- Surface and interface studies of silica-based thin films
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