Silicon dioxide (SiO2) sputtering targets made from fused quartz are solid ceramic-type sources used in physical vapor deposition. Silicon dioxide is an inorganic oxide from the dielectric and glass-forming material group, and fused quartz is an amorphous form of SiO2 known for its thermal stability and optical transparency. During sputtering, energetic ions eject material from the target surface, which then condenses as a thin film on a substrate.
- Quantity: 1 piece
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- Deposition of dielectric and insulating thin films for microelectronics research
- Fabrication of optical coatings and anti-reflective layers
- Protective and barrier layers on glass and other substrates
- Thin-film development studies in materials science laboratories
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