Silicon dioxide (SiO2) sputtering targets made from fused quartz are solid source materials used in physical vapor deposition (PVD), particularly magnetron and RF sputtering. Silicon dioxide is an oxide ceramic in the dielectric and glass-based material group, valued for its optical transparency and chemical stability. Fused quartz is the amorphous form of silica, which makes it a common starting material for sputtering targets used in thin-film research.
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- Optical thin films, such as anti-reflective and interference coatings
- Dielectric and insulating layers in microelectronics research
- Protective and barrier coatings on glass and other substrates
- Thin-film deposition process development in academic and industrial laboratories
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