Silicon dioxide (SiO2) sputtering targets made from fused quartz are solid source materials used in physical vapor deposition (PVD) processes to deposit thin films. Silicon dioxide is an oxide compound of silicon and oxygen, belonging to the oxide ceramics and dielectric materials group. Fused quartz is an amorphous, non-crystalline form of silica with a glassy structure. This nanomaterial product from Nanografi is intended for laboratory and research use.
- Quantity: 1 piece
For technical specifications, certificates of analysis (CoA), or a quotation, please contact AMI Scientific.
- Deposition of thin-film optical coatings
- Dielectric and insulating layers in microelectronics research
- Protective coatings on research substrates
- Surface modification and thin-film process development
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