Silicon dioxide (SiO2) sputtering targets made from fused quartz are solid inorganic oxide ceramic targets used as the source material in physical vapor deposition (PVD) processes. Fused quartz is an amorphous form of silica, classified within the oxide ceramics and dielectric materials group. During sputtering, the target material is ejected and deposited onto a substrate to form silicon dioxide thin films.
- Quantity: 1 piece
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- Deposition of SiO2 dielectric and insulating thin films for microelectronics research
- Optical coatings, including protective and anti-reflective layers
- Passivation and encapsulation layers in MEMS and microfabrication studies
- Surface modification research on glass and silicon substrates
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