Silicon dioxide (SiO2) sputtering targets made from fused quartz are solid oxide targets used in physical vapor deposition (PVD). Fused quartz is an amorphous form of silica, so the target provides a silica source for depositing thin SiO2 films onto substrates in a sputtering system. This material belongs to the oxide ceramic group and is used in thin film research and development.
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- Deposition of optical thin films, such as anti-reflective and protective layers
- Fabrication of dielectric and insulating layers in microelectronics research
- Growth of barrier and passivation coatings on laboratory substrates
- Development of silica-based waveguide and photonic device structures
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