Silicon dioxide (SiO2) sputtering targets made from fused quartz are solid ceramic source materials used in physical vapor deposition (PVD) processes. During sputtering, energetic ions bombard the target surface and eject SiO2 atoms that condense onto a substrate, forming thin films. Fused quartz is an amorphous, glass-like form of silicon dioxide, which makes it a common choice for depositing dielectric and optical layers. This material belongs to the oxide ceramics group.
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- Deposition of optical thin films, such as anti-reflective and protective coatings on glass and optical components
- Dielectric and insulating layers in microelectronics and semiconductor device research
- Passivation and barrier coatings in materials science studies
- Fabrication of silica-based thin films for sensor and photonics development
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