Silicon nitride (Si3N4) sputtering targets are ceramic source materials used in physical vapor deposition (PVD) to form thin silicon nitride films. Silicon nitride belongs to the nitride ceramics group, known for its hardness, chemical stability, and electrical insulating behavior. Nanografi supplies the target as a solid sputtering source for laboratory and pilot-scale deposition systems.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Dielectric and passivation layers in semiconductor and microelectronic device research
- Protective and wear-resistant coatings on tools and components
- Optical thin films for coating and waveguide studies
- MEMS device fabrication and surface engineering research
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