Silicon nitride (Si3N4) is an advanced ceramic compound of silicon and nitrogen, belonging to the group of nitride ceramics and dielectric materials. Sputtering targets made from silicon nitride serve as source materials in physical vapor deposition (PVD), where the target is bombarded with energetic ions so that its atoms are ejected and deposited as a thin film onto a substrate. Films produced this way are valued for their electrical insulation, chemical stability, and mechanical robustness.
- Quantity: 1 piece
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- Dielectric and passivation layers in microelectronics and semiconductor device research
- Hard, wear-resistant protective coatings on tools and components
- Optical thin films for coating and photonics research
- Microelectromechanical systems (MEMS) and microfabrication process development
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