Silicon nitride (Si3N4) is an advanced ceramic compound valued for its hardness, chemical stability, and electrical insulation. In this format, it is supplied as a sputtering target, a solid source material used in physical vapor deposition (PVD) to form thin films on substrates. It belongs to the nitride ceramics group and is widely used in research and industrial thin-film processes.
- Quantity: 1 piece
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- Deposition of dielectric and passivation layers in semiconductor device research
- Protective and wear-resistant coatings on tools and components
- Optical thin films for coating development
- Barrier and encapsulation layers in MEMS and microelectronics prototyping
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