Silicon nitride (Si3N4) sputtering targets are solid ceramic source materials used in physical vapor deposition (PVD) to form silicon nitride thin films. Silicon nitride belongs to the group of covalently bonded nitride ceramics, known for electrical insulation, chemical stability, and mechanical robustness. During sputtering, the target is bombarded with energetic ions in a vacuum chamber, releasing material that condenses onto a substrate as a uniform film.
- Quantity: 1 piece
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- Dielectric and passivation layer research in microelectronics and semiconductor devices
- Protective and hard coatings on tools and mechanical components
- Optical thin-film studies for coatings and photonic structures
- Fabrication research for MEMS and sensor devices
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