Silicon nitride (Si3N4) is an advanced ceramic compound of silicon and nitrogen, valued for its hardness, chemical stability, and electrical insulating behavior. In this format, it is supplied as a sputtering target, a solid source material used in physical vapor deposition (PVD) to form thin films on substrates.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Dielectric and passivation layers in microelectronics research
- Protective and barrier coatings for optical and mechanical components
- Thin-film deposition studies on semiconductor and glass substrates
- Wear-resistant hard coating development
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