Silicon nitride (Si3N4) sputtering targets are solid, dense ceramic plates used as the source material in physical vapor deposition (PVD) sputtering processes. Silicon nitride belongs to the group of advanced technical ceramics, valued for its hardness, chemical stability, and electrical insulating behavior. The target is mounted in a sputtering chamber and eroded by plasma ions, releasing material that deposits onto a substrate as a thin film. This makes it a common choice when researchers need an insulating or protective layer.
- Quantity: 1 piece
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- Deposition of dielectric and passivation thin films in semiconductor research
- Protective and wear-resistant coatings on tools and components
- Optical thin-film coatings for research prototypes
- Barrier layers in microelectronics and MEMS device development
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