This Nanografi silicon nitride (Si3N4) sputtering target is a 3'' disc, 0.125'' thick, with a purity of 99.9% and a white to gray appearance. It serves as the source material in sputter deposition systems for producing thin films.
In sputtering, material is eroded from the target and deposited onto a substrate such as a silicon wafer. The technique can coat substrates of many shapes and sizes, gives repeatable results, and scales from small research and development work to production batches covering medium to large substrate areas.
Depending on process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. The number of adjustable parameters makes sputtering complex, but it gives experienced users considerable control over film growth and microstructure.
- Deposition of silicon nitride thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Research and development work that can later be scaled to medium and large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST02SI01
- Material: Silicon Nitride (Si3N4)
- Size: 3''
- Thickness: 0.125''
- Color: White to Gray
- Product code: NG0ST02SI01
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