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Nanografi

Silicon (Si) Sputtering Targets, N-type

Silicon (Si) Sputtering Targets, N-type
Regular price Rp 11.182.000,00
Regular price Sale price Rp 11.182.000,00
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Silicon (Si) sputtering targets are solid source materials used in physical vapor deposition (PVD) to deposit silicon thin films onto substrates. This N-type variant is doped silicon, providing electron-dominant conduction for research on electronic and semiconductor films. Silicon belongs to the semiconductor material group, and this product falls under sputtering targets.

  • 1 piece

Contact AMI Scientific for technical specifications, CoA, or quotations.

  • Deposition of doped silicon films for semiconductor device research
  • Thin-film layers in photovoltaic and solar cell development
  • Microelectronics and MEMS fabrication studies
  • Optical and protective coating research

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