Silicon (Si) sputtering targets are solid, high-density discs or plates used as the source material in physical vapor deposition (PVD) sputtering systems. This N-type variant is silicon doped with donor elements, so electrons are the majority charge carriers. It belongs to the group of semiconductor target materials used to deposit silicon-based thin films onto substrates.
- 1 piece
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- Deposition of silicon-based thin films for semiconductor device research
- Fabrication of microelectromechanical systems (MEMS) layers
- Development of thin-film photovoltaic and solar cell structures
- Preparation of optical and protective coating layers
- Sensor and electronic component prototyping in academic and industrial laboratories
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