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Silicon (Si) Sputtering Targets, N-type

Silicon (Si) Sputtering Targets, N-type
Regular price Rp 16.291.000,00
Regular price Sale price Rp 16.291.000,00
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Silicon (Si) sputtering targets are solid discs or plates of elemental silicon used as source material in physical vapor deposition (sputtering) to form thin films. The N-type designation means the silicon is doped with donor impurities, which provide excess free electrons and give the material its electrical character. Silicon belongs to the semiconductor group of materials and is widely studied in electronics, optics, and energy research.

  • Quantity: 1 piece

For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.

  • Deposition of silicon-based thin films for semiconductor device research
  • Reactive sputtering of silicon compound layers such as oxides and nitrides for dielectric studies
  • Thin-film layers for photovoltaic and solar cell research
  • Prototyping of microelectromechanical systems (MEMS) and microelectronic components

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