Silicon (Si) sputtering targets are solid source materials used in physical vapor deposition (PVD) to deposit thin silicon films onto substrates. This N-type variant is doped with electron-donor impurities, so the deposited film can exhibit n-type electrical behavior. Sputtering targets belong to the advanced materials group used in thin-film and coating research.
- Quantity: 1 piece
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- Deposition of doped silicon thin films for semiconductor device research
- Fabrication of MEMS and microelectronic test structures
- Development of thin-film solar cell layers
- Reactive sputtering of silicon-based dielectric films such as SiO2 and Si3N4
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