Silicon (Si) sputtering targets are solid, high-purity plates made from silicon and used in physical vapor deposition (sputtering) to deposit thin films onto substrates. This N-type grade is silicon doped with donor elements, which gives it negative charge carriers (electrons) as the main conduction mechanism. It belongs to the semiconductor and thin-film material group.
- Quantity: 1 piece
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- Deposition of silicon-based thin films for semiconductor device research
- Fabrication of optical and protective coatings in thin-film laboratories
- Prototyping of MEMS devices and micro-sensors
- Research on photovoltaic and electronic thin-film layers
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