Silicon (Si) sputtering targets are solid, sputter-deposition source materials made from elemental silicon, a group IV semiconductor widely used in electronics and photovoltaics. This N-type grade is doped with electron-donating impurities, which increases the density of free negative charge carriers in the material. In physical vapor deposition (PVD), the target is bombarded with energetic ions so that silicon atoms are ejected and deposited as thin films onto a substrate.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.
- Deposition of silicon thin films for semiconductor device research
- Development of functional layers for photovoltaic and solar cell studies
- Prototyping of microelectronic and MEMS components
- Fabrication of silicon-based coatings for optical and materials research
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—