Silicon (Si) sputtering targets are solid source plates made of silicon, used in physical vapor deposition (sputtering) to produce thin films. This N-type grade is silicon doped with donor elements, so electrons are the majority charge carriers, which makes it relevant for electronic and semiconductor thin-film research. Nanografi materials are supplied for laboratory and pilot-scale coating work.
- Quantity: 1 piece
For technical specifications, certificates of analysis (CoA), or quotations, please contact AMI Scientific.
- Deposition of silicon-based thin films for semiconductor device research
- Photovoltaic and solar cell layer development
- Microelectronics and MEMS component prototyping
- Optical and protective coating studies
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