Silicon sputtering targets are solid, dense source materials used in physical vapor deposition (PVD), where atoms are ejected from the target surface and deposited onto a substrate to form thin films. This N-type variant is doped with electron-donating impurities, which makes it suitable for research on semiconductor thin films and doped silicon layers. It belongs to the sputtering target category used in advanced materials laboratories and thin-film development.
- 1 piece
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- Thin-film deposition research for semiconductor devices
- Development of photovoltaic and solar cell layers
- Microelectronics and MEMS prototyping
- Optical and protective coating studies
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