Silicon (Si) sputtering targets are solid, high-purity disks or plates used in physical vapor deposition (PVD) to produce thin silicon films on substrates. This N-type variant is silicon doped with an electron-donor element, which gives the deposited film n-type electrical behavior. Silicon targets belong to the semiconductor and thin-film materials group and are widely used in advanced materials research.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.
- Deposition of silicon-based thin films for semiconductor device research
- Fabrication of layers for photovoltaic and solar cell prototypes
- Development of MEMS and microelectronic component layers
- Preparation of silicon-containing coatings for optical and protective studies
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