Silicon (Si) sputtering targets are solid source materials used in physical vapor deposition (PVD) to produce thin films on substrates. This N-type variant is silicon doped with donor impurities, giving it extra free electrons for electronic and semiconductor applications. It belongs to the semiconductor and thin-film deposition materials group.
- Quantity: 1 piece
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- Deposition of silicon-based thin films for semiconductor device research
- Fabrication of photovoltaic and solar cell test structures
- Microelectromechanical systems (MEMS) and microfabrication processes
- Development of optical and protective coatings
- Nanostructure and nanoelectronics research
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