Silicon (Si) sputtering targets are solid, high-density source plates used in physical vapor deposition (PVD) to deposit silicon-based thin films onto substrates. This N-type variant is doped silicon, belonging to the group of semiconductor sputtering target materials. The N-type designation indicates doping with electron-donor impurities, which makes the material suitable for thin-film work where controlled electrical conductivity is required.
- Quantity: 1 piece
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- Deposition of silicon thin films for semiconductor device research
- Fabrication of thin-film photovoltaic layers in laboratory studies
- Development of microelectronic and MEMS component layers
- Preparation of silicon-based coatings for optical and surface science research
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