Silicon sputtering targets are solid disks or plates of elemental silicon used as the source material in physical vapor deposition (PVD) sputtering processes to form thin films. This P-type variant is doped with indium, which introduces positive charge carriers into the silicon lattice. It belongs to the semiconductor target materials group.
- Quantity: 1 piece
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- Deposition of thin silicon-based films for semiconductor device research
- Fabrication of thin-film photovoltaic and solar cell prototypes
- Development of MEMS and microelectronic test structures
- Surface and interface studies in materials science laboratories
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