Silicon (Si) sputtering targets are solid source materials used in physical vapor deposition (PVD) to form silicon thin films. This P-type variant is doped with indium, an acceptor dopient that introduces positive charge carriers (holes) into the silicon lattice, which makes it useful for studies of controlled electronic properties. Nanografi sputtering targets are supplied for research and industrial thin-film processes.
- Quantity: 1 piece
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- Deposition of doped silicon thin films for semiconductor device research
- Development of photovoltaic and solar cell layers
- Microelectronics and MEMS prototyping
- Optical and protective coating studies
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