Silicon (Si) sputtering targets are solid source plates used in physical vapor deposition (PVD) to deposit thin silicon films onto substrates. This item is a P-type target, meaning the silicon is doped with indium to provide positive charge carriers. It belongs to the group of semiconductor sputtering materials commonly used in electronic and thin-film research.
- Quantity: 1 piece
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- Thin-film deposition for semiconductor device research
- Development of photovoltaic and solar cell layers
- Microelectronics and MEMS prototyping
- Sensor and optoelectronic coating studies
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