Silicon (Si) sputtering targets are solid, dense source plates used in physical vapor deposition (PVD) to deposit silicon thin films onto substrates. Silicon is a group IV semiconductor, and this P-type grade is doped so that positive charge carriers (holes) are the majority carriers. The target is specified with indium, as listed in the product title.
- Quantity: 1 piece
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- Deposition of silicon thin films for semiconductor device research
- Prototyping of microelectronic and MEMS layers
- Studies of thin-film photovoltaic and solar cell structures
- Development of functional coatings and doped silicon layers for materials research
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