P-type silicon (Si) sputtering targets are solid, high-density source materials used in physical vapor deposition (PVD) to deposit thin silicon-based films onto substrates. As a semiconductor material, silicon belongs to the group of elemental semiconductor targets. The P-type designation indicates that the material is doped with acceptor atoms, which gives it a positive charge carrier character suited to electronic and photonic research.
- Quantity: 1 piece
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- Deposition of thin silicon films for semiconductor device prototyping
- Fabrication of layers for MEMS and microsensor research
- Development of thin-film structures for photovoltaic studies
- Creation of silicon-based dielectric or optical coatings through reactive sputtering
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