Silicon (Si) sputtering targets are solid source plates used in physical vapor deposition (sputtering) to deposit silicon thin films onto substrates. Silicon is a group IV semiconductor element widely used in electronics and photonics. The P-type designation indicates that the silicon is doped with acceptor impurities, creating an excess of positive charge carriers (holes) that suits p-type semiconductor layers and junction research.
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- Deposition of silicon thin films for semiconductor device research and prototyping
- Fabrication of p-type layers in photovoltaic and solar cell development
- Thin-film layers for MEMS and microelectronic device fabrication
- Optical and dielectric coating studies in university and industrial laboratories
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