Silicon (Si) sputtering targets are solid, high-density source plates used in physical vapor deposition (PVD) to produce silicon thin films. This P-type version is doped with acceptor elements, so holes are the majority charge carriers. It belongs to the semiconductor material group and is widely used in thin-film research and device development.
- Quantity: 1 piece
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- Deposition of silicon thin films for microelectronic and semiconductor device research
- Fabrication of photovoltaic and solar cell layers in laboratory studies
- Development of MEMS and sensor structures requiring silicon coatings
- Optical and dielectric coating studies based on silicon-containing films
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